Analysis Native Oxide Formation Kinetics in Nanometer-Scale NbTiN Thin Films

Sami A. Nazib; Mark V. Reymatias; Troy A. Hutchins-Delgado; Shruti I. Gharde; Erika M. Sommer; Erum Jamil; Gennady A. Smolyakov; Tzu-Ming Lu; Sergei A. Ivanov; Ivan Komissarov; Roman Sobolewski; Marek Osinski

doi:10.1109/NMDC57951.2023.10343963

Conference proceeding

Analysis Native Oxide Formation Kinetics in Nanometer-Scale NbTiN Thin Films

Sami A. Nazib, Mark V. Reymatias, Troy A. Hutchins-Delgado, Shruti I. Gharde, Erika M. Sommer, Erum Jamil, Gennady A. Smolyakov, Tzu-Ming Lu, Sergei A. Ivanov, Ivan Komissarov, …

IEEE Nanotechnology Materials and Devices Conference, pp.366-367

10/22/2023

DOI: https://doi.org/10.1109/NMDC57951.2023.10343963

Abstract and subjects

atomic force microscopy

Films

native oxide

NbTiN

Oxidation

Photoelectron microscopy

Photonic integrated circuits

Physical vapor deposition

Silicon

Silicon nitride

X-ray diffraction

X-ray fluorescence

X-ray photoelectron spectroscopy

X-ray reflection

Comprehensive characterization techniques are applied to investigate the kinetics of native oxide formation on nanometer-scale films of NbTiN deposited using a physical vapor deposition process on silicon substrates coated with silicon nitride.

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Title: Analysis Native Oxide Formation Kinetics in Nanometer-Scale NbTiN Thin Films
Authors/Creators - name: Sami A. Nazib
Mark V. Reymatias
Troy A. Hutchins-Delgado
Shruti I. Gharde
Erika M. Sommer
Erum Jamil
Gennady A. Smolyakov
Tzu-Ming Lu
Sergei A. Ivanov
Ivan Komissarov
Roman Sobolewski
Marek Osinski
Publication Details: IEEE Nanotechnology Materials and Devices Conference, pp.366-367
Publisher: IEEE
Number of pages: 2
Language: English
Resource Type: Conference proceeding
ISBN: 9798350335460; 9798350335460
DOI: https://doi.org/10.1109/NMDC57951.2023.10343963
Publication ISSN: 2473-0718